Resists and Dielectrics
Hardback
Publication Date: 01/01/1994
Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists.
- ISBN:
- 9780841227217
- 9780841227217
- Category:
- Plastics & polymers technology
- Format:
- Hardback
- Publication Date:
- 01-01-1994
- Language:
- English
- Publisher:
- American Chemical Society
- Country of origin:
- United States
- Pages:
- 554
- Dimensions (mm):
- 234x158x32mm
- Weight:
- 0.88kg
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